Japan Intellectual Property Rights: APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT ION SOURCE AND RADICAL SOURCE

Japan, June 10 -- APPLIED MATERIALS INC has got intellectual property rights for 'APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT ION SOURCE AND RADICAL SOURCE.' Other related details are as follows:

Application Number: JP,2024-186795

Category (FI): H05H1/46@A,H01J37/305@A,H01J37/30@A,H01J37/147@D,H01J37/317@E

Stage: Grant (IP right document published.)

Filing Date: Oct. 23, 2024

Publication Date: Feb. 19, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.