Japan, Jan. 20 -- FUJIFILM CORP has got intellectual property rights for 'CHEMICAL LIQUID, CHEMICAL LIQUID HOUSING BODY, RESIST PATTERN FORMATION METHOD, AND PRODUCTION METHOD FOR SEMICONDUCTOR CHIPS.' Other related details are as follows:
Application Number: JP,2022-211027
Category (FI): G03F7/039,601,H01L21/30,569@E,G03F7/038,601,H10P76/00,569@E,G03F7/20,521,G03F7/32,G03F7/32,501
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Dec. 28, 2022
Publication Date: March 3, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
