Japan Intellectual Property Rights: COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Japan, Jan. 23 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows:

Application Number: JP,2021-096172

Category (FI): G03F7/004,501,G03F7/039,601,G03F7/038,601,C08F220/30,C07C69/54@Z,C07C69/653,G03F7/004,503@A,C08F246/00

Stage: Grant (IP right document published.)

Filing Date: June 8, 2021

Publication Date: Jan. 13, 2022

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.