Japan, Jan. 23 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows:
Application Number: JP,2021-031129
Category (FI): C07D307/00,C07C69/757@Z,G03F7/004,503@A,G03F7/039,601,G03F7/038,601,G03F7/20,501,G03F7/20,521,C08F120/26,C08F120/38,C07D313/10,C07D327/06,G03F7/004,501
Stage: Grant (IP right document published.)
Filing Date: Feb. 26, 2021
Publication Date: Oct. 14, 2021
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
