Japan Intellectual Property Rights: COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM AND PATTERN FORMING METHOD

Japan, Jan. 16 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-022005

Category (FI): C07F7/22@K,C07F7/22@L,C07F7/22@M,G03F7/039,601,G03F7/11,502,G03F7/11,503,G03F7/20,501,G03F7/20,521,G03F7/26,511

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Feb. 15, 2023

Publication Date: Aug. 27, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.