Japan Intellectual Property Rights: CONTROLLED ION IMPLANTATION INTO SILICON CARBIDE

Japan, Jan. 23 -- CREE INC has got intellectual property rights for 'CONTROLLED ION IMPLANTATION INTO SILICON CARBIDE.' Other related details are as follows:

Application Number: JP,2021-202470

Category (FI): H01L29/86,301@E,H01L21/265@U,H01L21/265,602@A,H01L21/265@T,H01L29/78,652@T,H01L29/78,655@A,H01L29/78,652@P,H01L29/06,301@G,H01L29/06,301@V,H01L29/78,652@C,H01L29/78,652@J,H01L29/78,658@A,H01L29/78,652@E,H01L29/86,301@D,H01L29/86,301@F,H01L29/91@K,H01L29/91@F,H01L29/91@A,H01L21/265@Z,H10D8/01@A,H10D8/50@F,H10D8/50@K,H10D8/60@F,H10D8/60@E,H10D8/60@D,H10D30/01,301@A,H10D30/66,101@C,H10D30/66,101@E,H10D30/66,101@H,H10D30/66,101@T,H10D30/66,103@C,H10D62/10,101@G,H10D62/10,101@V,H10P30/20@T,H10P30/20@U,H10P30/20@Z,H10P30/28@H

Stage: Grant (IP right document published.)

Filing Date: Dec. 14, 2021

Publication Date: Feb. 22, 2022

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.