Japan, July 14 -- EN2CORE TECHNOLOGY INC has got intellectual property rights for 'INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATOR.' Other related details are as follows:
Application Number: JP,2025-061733
Category (FI): H10P50/20,101@C,H05H1/46@L,H01L21/302,101@C
Stage: PROBLEM TO BE SOLVED: To provide an inductively coupled plasma generator, in which capacitive coupling is reduced by the structure of an inductive coil and improved stability and efficiency can be achieved.SOLUTION: An inductively coupled plasma generator 100 includes: a dielectric tube 130 extending in a length direction; a first inductive coil structure 110, which is provided to enclose the dielectric tube 130 and produces inductively-coupled plasma in the dielectric tube 130; an RF power supply 140, which is configured to provide positive and negative powers having opposite phases, to respectively supply positive and negative powers of RF power 140 to both ends of the first inductive coil structure 110, and to change a driving frequency; a first main capacitor 121 provided between a positive output terminal of the RF power supply 140 and one end of the first inductive coil structure 110; and a second main capacitor 122 provided between a negative output terminal of the RF power supply 140 and the other end of the first inductive coil structure 110.SELECTED DRAWING: Figure 2A (Grant)
Filing Date: April 3, 2025
Publication Date: July 23, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
