Japan, June 10 -- APPLIED MATERIALS INC has got intellectual property rights for 'INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRIDE DEPOSITION.' Other related details are as follows:
Application Number: JP,2025-042037
Category (FI): C23C16/04,C23C16/42,H10D30/69,H10B41/27,H01L21/31@B,H10P14/694@B,H10P14/60,101@B,H01L21/318@B,H10B43/27
Stage: Grant (IP right granted following substantive examination.)
Filing Date: March 17, 2025
Publication Date: Aug. 13, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
