Japan, Jan. 23 -- RUMIJI-NTEC CO LTD has got intellectual property rights for 'METHOD FOR MANUFACTURING SEPARABLE SEMICONDUCTOR SUBSTRATE, SEPARABLE SEMICONDUCTOR SUBSTRATE MANUFACTURED THEREBY, THIN FILM ELEMENT AND COMPOSITE ELEMENT.' Other related details are as follows:
Application Number: JP,2024-117791
Category (FI): C23C16/32,C23C16/34,C30B25/02@Z,C30B29/38@D
Stage: Grant (IP right granted following substantive examination.)
Filing Date: July 23, 2024
Publication Date: Feb. 5, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
