Japan, Nov. 10 -- GLOBALWAFERS JAPAN CO LTD has got intellectual property rights for 'METHOD FOR MANUFACTURING SILICON EPITAXIAL SUBSTRATE, AND SILICON EPITAXIAL SUBSTRATE.' Other related details are as follows:
Application Number: JP,2021-208506
Category (FI): C30B29/06,504@A,C30B25/20,H01L21/20,H10P14/20,C30B29/06,502,C30B15/00@Z
Stage: Grant (IP right document published.)
Filing Date: Dec. 22, 2021
Publication Date: July 4, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
