Japan, July 27 -- ASM IP HOLDING BV has got intellectual property rights for 'METHODS FOR FORMING TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM BY CYCLICAL PLASMA-ENHANCED DEPOSITION PROCESS.' Other related details are as follows:
Application Number: JP,2025-010673
Category (FI): H01L21/316@X,H01L21/31@C,C23C16/40,H10P14/60,101@C,H10P14/692@X
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Jan. 24, 2025
Publication Date: April 30, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
