Japan, July 27 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'MONOMER, RESIST MATERIAL, RESIST COMPOSITION, AND PATTERNING PROCESS.' Other related details are as follows:
Application Number: JP,2023-068852
Category (FI): G03F7/20,521,C07C381/12,C07C69/86,G03F7/20,501,C07D333/76,G03F7/004,501,G03F7/004,503@A,G03F7/039,601,C08F220/12,C07C25/18
Stage: Grant (IP right granted following substantive examination.)
Filing Date: April 19, 2023
Publication Date: Oct. 31, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
