Japan, Jan. 23 -- ASAHI KASEI CORP has got intellectual property rights for 'NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING CURED RELIEF PATTERN USING THE SAME.' Other related details are as follows:
Application Number: JP,2020-204150
Category (FI): C08F290/14,C08G73/10,G03F7/004,504,G03F7/027,502,G03F7/027,514,G03F7/20,501,G03F7/20,521
Stage: Grant (IP right document published.)
Filing Date: Dec. 9, 2020
Publication Date: June 21, 2022
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
