Japan, Nov. 11 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'NEGATIVE RESIST MATERIAL AND PATTERNING METHOD.' Other related details are as follows:
Application Number: JP,2022-110873
Category (FI): G03F7/20,521,G03F7/004,501,G03F7/20,501,G03F7/039,601,G03F7/004,503@A,G03F7/038,601,G03F7/32
Stage: Grant (IP right granted following substantive examination.)
Filing Date: July 11, 2022
Publication Date: Feb. 9, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
