Japan, Jan. 20 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PATTERN FORMATION METHOD, AND LIGHT-EMITTING ELEMENT.' Other related details are as follows:
Application Number: JP,2022-160787
Category (FI): G03F7/027,502,G02B5/20,C09K11/08@G,G03F7/20,501,C09K111:00,G03F7/075,501,C09K113:00,G03F7/004,501
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Oct. 5, 2022
Publication Date: April 17, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
