Japan, Jan. 23 -- NISSAN CHEM CORP has got intellectual property rights for 'PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING UNDERLAYER FILM OF RESIST FILM.' Other related details are as follows:
Application Number: JP,2024-153164
Category (FI): H10K59/122,G03F7/11,503,H10K59/124,C08F20/56
Stage: Grant (IP right document published.)
Filing Date: Sept. 5, 2024
Publication Date: Nov. 28, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
