Japan Intellectual Property Rights: PHOTOSENSITIVE RESIN LAMINATE AND RESIST PATTERN FORMATION METHOD

Japan, Jan. 16 -- ASAHI KASEI CORP has got intellectual property rights for 'PHOTOSENSITIVE RESIN LAMINATE AND RESIST PATTERN FORMATION METHOD.' Other related details are as follows:

Application Number: JP,2021-111624

Category (FI): G03F7/004,503@Z,G03F7/004,505,G03F7/004,507,G03F7/004,512,G03F7/029,H05K3/06@H,H05K3/06@J,H05K3/18@D

Stage: Grant (IP right document published.)

Filing Date: July 5, 2021

Publication Date: March 11, 2022

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.