Japan Intellectual Property Rights: PLASMA PROCESSING DEVICE

Japan, Feb. 27 -- TOKYO ELECTRON LTD has got intellectual property rights for 'PLASMA PROCESSING DEVICE.' Other related details are as follows:

Application Number: JP,2022-097169

Category (FI): H05H1/46@B,H10P14/60,101@C,H01L21/31@C

Stage: PROBLEM TO BE SOLVED: To provide a technology that reduces the size of an electromagnetic wave resonator in a plasma processing device.SOLUTION: A plasma processing device disclosed herein includes a chamber and a waveguide. The waveguide is configured to propagate electromagnetic waves to generate a plasma within the chamber. The waveguide includes a resonator configured to resonate electromagnetic waves therein. The resonator includes a microstrip and a dielectric member. A portion of the dielectric member constitutes a dielectric layer of the microstrip.SELECTED DRAWING: Figure 1 (Grant)

Filing Date: June 16, 2022

Publication Date: Dec. 28, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.