Japan, Jan. 16 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST COMPOSITION, AND METHOD OF FORMING PATTERN.' Other related details are as follows:
Application Number: JP,2022-126073
Category (FI): C08F212/14,C08F220/38,G03F7/004,501,G03F7/004,503@A,G03F7/038,601,G03F7/039,601,G03F7/20,501,G03F7/20,521
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Aug. 8, 2022
Publication Date: Feb. 21, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
