Japan Intellectual Property Rights: SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, APPARATUS, SUBSTRATE, AND METHOD FOR MANUFACTURING SUBSTRATE

Japan, Nov. 4 -- CANON INC has got intellectual property rights for 'SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, APPARATUS, SUBSTRATE, AND METHOD FOR MANUFACTURING SUBSTRATE.' Other related details are as follows:

Application Number: JP,2022-099665

Category (FI): H01L27/04@H,H01L27/146@F,H01L27/146@A,H10F39/18@A,H10D84/80,102@Z,H01L27/06,311@Z,H10F39/18@F,H10D84/80,101@A,H01L27/06,102@A,H10D89/60

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 21, 2022

Publication Date: Jan. 9, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.