Japan Intellectual Property Rights: SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

Japan, Nov. 4 -- SAMSUNG SDI CO LTD has got intellectual property rights for 'SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME.' Other related details are as follows:

Application Number: JP,2024-202855

Category (FI): G03F7/20,504,G03F7/20,521,G03F7/20,503,G03F7/004,531,G03F7/004,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Nov. 21, 2024

Publication Date: July 15, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.