Japan Intellectual Property Rights: SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE

Japan, Nov. 10 -- MITSUYASU JAPAN TECHNOLOGY CO LTD has got intellectual property rights for 'SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE.' Other related details are as follows:

Application Number: JP,2022-015992

Category (FI): H10P14/694@C,H01L21/318@M,H01L21/316@M,H01L21/318@C,H10P14/692@M,H10P14/694@M

Stage: Grant (IP right document published.)

Filing Date: Feb. 3, 2022

Publication Date: Aug. 16, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.