Japan, Nov. 11 -- NISSAN CHEM CORP has got intellectual property rights for 'SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS PROTECTED PHENOLIC GROUP AND NITRIC ACID.' Other related details are as follows:
Application Number: JP,2023-163712
Category (FI): C08G77/38,C08G77/14,G03F7/11,502,G03F7/11,503
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Sept. 26, 2023
Publication Date: Dec. 12, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
