Japan, Jan. 23 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD OF PURGE GAS AND CLEANING METHOD OF VACUUM TRANSFER CHAMBER.' Other related details are as follows:
Application Number: JP,2021-121717
Category (FI): H10P72/30@A,H01L21/68@A
Stage: Grant (IP right document published.)
Filing Date: July 26, 2021
Publication Date: March 30, 2022
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
