Japan, Jan. 20 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS.' Other related details are as follows:
Application Number: JP,2025-019988
Category (FI): H10P14/60,101@C,H10P14/24,H01L21/314@A,H01L21/205,C23C16/26,H10P14/69@A,H01L21/31@C
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Feb. 10, 2025
Publication Date: April 17, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
