Japan Intellectual Property Rights: SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE

Japan, Oct. 5 -- FUJIMI INC has got intellectual property rights for 'SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE.' Other related details are as follows:

Application Number: JP,2023-052681

Category (FI): C11D1/66,C11D3/26,C11D3/28,C11D3/37,H01L21/304,622@Q,H01L21/304,644@A,H01L21/304,647@A,H10P52/00@T,H10P70/00,104@A,H10P70/00,107@A

Stage: Grant (IP right granted following substantive examination.)

Filing Date: March 29, 2023

Publication Date: April 10, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.