Japan Intellectual Property Rights: DEVICE, METHOD, AND GRAPHICAL USER INTERFACE FOR DEPTH-BASED ANNOTATION

Japan, Nov. 17 -- APPLE INC has got intellectual property rights for 'DEVICE, METHOD, AND GRAPHICAL USER INTERFACE FOR DEPTH-BASED ANNOTATION.' Other related details are as follows: Application Number: JP,2024-113573 Category (FI): G06F3/01,510,G06F3/0481,G06T19/00@A Stage: Grant (IP right granted following substantive examination.) Filing Date: July 16, 2024 Publication Date: Nov. 6, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: Curated ...


Japan Intellectual Property Rights: ZOOM LENS AND IMAGING APPARATUS

Japan, Nov. 17 -- TAMRON CO LTD has got intellectual property rights for 'ZOOM LENS AND IMAGING APPARATUS.' Other related details are as follows: Application Number: JP,2024-147723 Category (FI): G02B13/18,G02B15/20 Stage: Grant (IP right granted following substantive examination.) Filing Date: Aug. 29, 2024 Publication Date: Oct. 31, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: Curated by HT Syndication....


Japan Intellectual Property Rights: SPRAY-DRIED COFFEE PRODUCT AND PRODUCTION METHOD THEREOF

Japan, Nov. 17 -- KONINKLIJKE DOUWE EGBERTS BV has got intellectual property rights for 'SPRAY-DRIED COFFEE PRODUCT AND PRODUCTION METHOD THEREOF.' Other related details are as follows: Application Number: JP,2024-134281 Category (FI): A23F5/28,A23F5/36 Stage: Grant (IP right granted following substantive examination.) Filing Date: Aug. 9, 2024 Publication Date: Oct. 31, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: Curated by HT Syndicat...


Japan Intellectual Property Rights: NITRIDE PHOSPHOR AND LIGHT-EMITTING DEVICE

Japan, Nov. 17 -- NICHIA CHEM IND LTD has got intellectual property rights for 'NITRIDE PHOSPHOR AND LIGHT-EMITTING DEVICE.' Other related details are as follows: Application Number: JP,2024-129729 Category (FI): C09K11/61,C09K11/62,C09K11/66,C09K11/64,C09K11/80,C09K11/08@J,H01L33/50,H10H20/851,C09K11/67,C09K11/59 Stage: Grant (IP right granted following substantive examination.) Filing Date: Aug. 6, 2024 Publication Date: Oct. 29, 2024 The original document can be viewed at: https://www.j...


Japan Intellectual Property Rights: SYSTEM AND METHOD FOR INSPECTING MASK FOR EUV LITHOGRAPHY

Japan, Nov. 17 -- CARL ZEISS SMT GMBH has got intellectual property rights for 'SYSTEM AND METHOD FOR INSPECTING MASK FOR EUV LITHOGRAPHY.' Other related details are as follows: Application Number: JP,2024-101467 Category (FI): G03F1/22,G03F1/84 Stage: Grant (IP right granted following substantive examination.) Filing Date: June 24, 2024 Publication Date: Oct. 29, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: Curated by HT Syndication....


Japan Intellectual Property Rights: SLOPE PROTECTION TOOL

Japan, Nov. 17 -- NISSHOKU CORP has got intellectual property rights for 'SLOPE PROTECTION TOOL.' Other related details are as follows: Application Number: JP,2024-141890 Category (FI): E02D17/20,103@C,E02D17/20,102@D,E02D17/20,102@A,E02D17/20,106 Stage: Grant (IP right granted following substantive examination.) Filing Date: Aug. 23, 2024 Publication Date: Oct. 25, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: Curated by HT Syndication....


Japan Intellectual Property Rights: ADHESIVE COMPOSITION, ADHESIVE FILM AND SURFACE PROTECTIVE FILM

Japan, Nov. 17 -- FUJIMORI KOGYO CO LTD has got intellectual property rights for 'ADHESIVE COMPOSITION, ADHESIVE FILM AND SURFACE PROTECTIVE FILM.' Other related details are as follows: Application Number: JP,2024-129787 Category (FI): C09J133/14,C09J7/38,C09J133/06,C09J11/06,C09J175/04 Stage: Grant (IP right granted following substantive examination.) Filing Date: Aug. 6, 2024 Publication Date: Oct. 25, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 ...


Japan Intellectual Property Rights: REACTOR

Japan, Nov. 17 -- TAMURA SEISAKUSHO CO LTD has got intellectual property rights for 'REACTOR.' Other related details are as follows: Application Number: JP,2024-129743 Category (FI): H01F37/00@M,H01F37/00@T,H01F37/00@A Stage: Grant (IP right granted following substantive examination.) Filing Date: Aug. 6, 2024 Publication Date: Oct. 25, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: Curated by HT Syndication....


Japan Intellectual Property Rights: CELL AND ELECTRONIC APPLIANCE

Japan, Nov. 17 -- AESC JAPAN LTD has got intellectual property rights for 'CELL AND ELECTRONIC APPLIANCE.' Other related details are as follows: Application Number: JP,2023-210709 Category (FI): H01M4/136,H01M4/13,H01M10/052,H01M4/505,H01M4/58,H01M4/525,H01M4/587,H01M4/38@Z Stage: Grant (IP right granted following substantive examination.) Filing Date: Dec. 14, 2023 Publication Date: Oct. 25, 2024 The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100 Disclaimer: ...


Japan Intellectual Property Rights: WASTE LIQUID DEWATERING METHOD, METHOD FOR DISPOSAL OF RETENTION MEDIUM USED IN WASTE LIQUID DEWATERING METHOD, AND METHOD FOR DISPOSAL OF RESIDUAL MATERIAL AFTER MICROWAVE APPLICATION TO WASTE LIQUID IN WASTE LIQUID DEWATERING METHOD

Japan, Nov. 17 -- TAIHEI DENGYO KAISHA LTD has got intellectual property rights for 'WASTE LIQUID DEWATERING METHOD, METHOD FOR DISPOSAL OF RETENTION MEDIUM USED IN WASTE LIQUID DEWATERING METHOD, AND METHOD FOR DISPOSAL OF RESIDUAL MATERIAL AFTER MICROWAVE APPLICATION TO WASTE LIQUID IN WASTE LIQUID DEWATERING METHOD.' Other related details are as follows: Application Number: JP,2023-066609 Category (FI): B01D1/00@Z,B01J20/26@D,C02F1/30,G21F9/06@Z,G21F9/08,521@C Stage: Grant (IP right grante...